Electrophoretic Carbon Nanotube Field Emission Layer for Plasma Display Panels
Corresponding Author: Guifu Ding
Nano-Micro Letters,
Vol. 4 No. 4 (2012), Article Number: 247-252
Abstract
A carbon-nanotube (CNT) electrophoretic deposition (EPD) process has been developed to prepare a field emission layer in plasma display panels (PDP) for discharge voltage reduction. The CNT layer as a source of discharge priming electrons has been fabricated on the PDP front panel. The balling grinding, mix-acid treatment and EPD parameters have been investigated in order to obtain good uniformity and excellent field emission capability of CNT layer, in order to meet the specifications of CNTs in PDP cell. The measured turn-on field was around 1.1 V/μm in the field emission testing while the minimum sustaining voltage was decreased by 30∼40 V with the use of CNT layer in the discharge testing.
Keywords
Download Citation
Endnote/Zotero/Mendeley (RIS)BibTeX
- In Cheol Song, Jung-Woo Ok, Seok Won Hwang, Ho-Jun Lee, Chung-Hoo Park, Don-Kyu Lee and Hae June L, Thin Solid Films 518, 3122 (2010).
- Kwan Hyun Cho, Sung Il Ahn, Seong Min Lee and Kyung Cheol Choi, IEEE T. Electron Dev. 57, 2183 (2010). http://dx.doi.org/10.1109/TED.2010.2052693
- Chung-Hoo Park, Young-Kee Kim, Byeong-Eon Park, Woo-Geun Lee and Jung-Soo Cho, Mater. Sci. Eng. 60, 149 (1999). http://dx.doi.org/10.1016/S0921-5107(99)00028-8
- G. S. Lee, J. Y. Lee, Y. B. Cheon, K. B. Kim, J. J. Kim and S. H. Sohn, Thin Solid Films 519, 3037 (2011). http://dx.doi.org/10.1016/j.tsf.2010.12.019
- Hae-Yoon Jung, Tae-Ho Lee, Ohyung Kwon, Hee-Woon Cheong, Sven Ole Steinmüller, Jürgen Janek and Ki-Woong Whang, IEEE Elec. Dev. Lett. 31, 686 (2010). http://dx.doi.org/10.1109/LED.2010.2047236
- Seung-Hyeon Yang, Joeoong Hahn, Jaeik Han, Jong-Deok Lee and Tae-Seung Cho, IEEE T. Plasma Sci. 38, 1639 (2010). http://dx.doi.org/10.1109/TPS.2010.2047952
- Rakhwan Kim, Younghyun Kim and Jong-Wan Park, Vacuum 61, 37 (2001). http://dx.doi.org/10.1016/S0042-207X(00)00431-0
- Woo Hyun Kim, Kwan Hyun Cho and Kyung Cheol Choi, IEEE T Electron Dev. 57, 2644 (2010). http://dx.doi.org/10.1109/TED.2010.2058850
- Sang Hoon Yoon, Jin-Seok Kim and Yong-Seog Kim, Curr. Appl. Phys. 6S1, e154 (2006).
- Akihiro Nakao, Yoshikazu Tanaka and Ari Ide-Ektessabi, Surf. Coat. Tech. 203, 2731 (2009). http://dx.doi.org/10.1016/j.surfcoat.2009.02.102
- Van der Biest OO and L. J. Vandeperre, Annu. Rev. Mater. Sci. 29, http://dx.doi.org/10.1146/annurev.matsci.29.1.327
- A. R. Boccaccini and I. Zhitomirsky, Curr. Opin. Solid State Mater. Sci. 6, 251 (2002). http://dx.doi.org/10.1016/S1359-0286(02)00080-3
- B. J. C. Thomas, A. R. Boccaccini and M. S. P. Shaffer, J. Am. Ceram. Soc. 88, 980 (2005). http://dx.doi.org/10.1111/j.1551-2916.2005.00155.x
- B. J. C. Thomas, M. S. P. Shaffer, S. Freeman, M. Koopman, K. K. Chawla and A. R. Boccaccini, Proceedings of the 2nd International Conference on Electrophoretic Deposition: Key Engineering Materials 314, 141 (2006). http://dx.doi.org/10.4028/www.scientific.net/KEM.314.141
- J. M. Moon, K. H. An, Y. H. Lee, Y. S. Park, D. J. Bae and G. S. Park, J. Phys. Chem. B 105, 5677 (2001). http://dx.doi.org/10.1021/jp0102365
- J. Bae, Y. Yoon, S. Lee and H. Baik, Physica B 323, 169 (2002). http://dx.doi.org/10.1016/S0921-4526(02)00890-6
- D. Kurnosov, A. S. Bugaev, K. N. Nikolski, R. Tchesov and E. Sheshin, Appl. Surf. Sci. 215, 232 (2003). http://dx.doi.org/10.1016/S0169-4332(03)00307-6
- H. Ma, L. Zhang, J. Zhang, L. Zhang, N. Yao and B. Zang, Appl. Surf. Sci. 251, 258 (2005). http://dx.doi.org/10.1016/j.apsusc.2005.03.100
References
In Cheol Song, Jung-Woo Ok, Seok Won Hwang, Ho-Jun Lee, Chung-Hoo Park, Don-Kyu Lee and Hae June L, Thin Solid Films 518, 3122 (2010).
Kwan Hyun Cho, Sung Il Ahn, Seong Min Lee and Kyung Cheol Choi, IEEE T. Electron Dev. 57, 2183 (2010). http://dx.doi.org/10.1109/TED.2010.2052693
Chung-Hoo Park, Young-Kee Kim, Byeong-Eon Park, Woo-Geun Lee and Jung-Soo Cho, Mater. Sci. Eng. 60, 149 (1999). http://dx.doi.org/10.1016/S0921-5107(99)00028-8
G. S. Lee, J. Y. Lee, Y. B. Cheon, K. B. Kim, J. J. Kim and S. H. Sohn, Thin Solid Films 519, 3037 (2011). http://dx.doi.org/10.1016/j.tsf.2010.12.019
Hae-Yoon Jung, Tae-Ho Lee, Ohyung Kwon, Hee-Woon Cheong, Sven Ole Steinmüller, Jürgen Janek and Ki-Woong Whang, IEEE Elec. Dev. Lett. 31, 686 (2010). http://dx.doi.org/10.1109/LED.2010.2047236
Seung-Hyeon Yang, Joeoong Hahn, Jaeik Han, Jong-Deok Lee and Tae-Seung Cho, IEEE T. Plasma Sci. 38, 1639 (2010). http://dx.doi.org/10.1109/TPS.2010.2047952
Rakhwan Kim, Younghyun Kim and Jong-Wan Park, Vacuum 61, 37 (2001). http://dx.doi.org/10.1016/S0042-207X(00)00431-0
Woo Hyun Kim, Kwan Hyun Cho and Kyung Cheol Choi, IEEE T Electron Dev. 57, 2644 (2010). http://dx.doi.org/10.1109/TED.2010.2058850
Sang Hoon Yoon, Jin-Seok Kim and Yong-Seog Kim, Curr. Appl. Phys. 6S1, e154 (2006).
Akihiro Nakao, Yoshikazu Tanaka and Ari Ide-Ektessabi, Surf. Coat. Tech. 203, 2731 (2009). http://dx.doi.org/10.1016/j.surfcoat.2009.02.102
Van der Biest OO and L. J. Vandeperre, Annu. Rev. Mater. Sci. 29, http://dx.doi.org/10.1146/annurev.matsci.29.1.327
A. R. Boccaccini and I. Zhitomirsky, Curr. Opin. Solid State Mater. Sci. 6, 251 (2002). http://dx.doi.org/10.1016/S1359-0286(02)00080-3
B. J. C. Thomas, A. R. Boccaccini and M. S. P. Shaffer, J. Am. Ceram. Soc. 88, 980 (2005). http://dx.doi.org/10.1111/j.1551-2916.2005.00155.x
B. J. C. Thomas, M. S. P. Shaffer, S. Freeman, M. Koopman, K. K. Chawla and A. R. Boccaccini, Proceedings of the 2nd International Conference on Electrophoretic Deposition: Key Engineering Materials 314, 141 (2006). http://dx.doi.org/10.4028/www.scientific.net/KEM.314.141
J. M. Moon, K. H. An, Y. H. Lee, Y. S. Park, D. J. Bae and G. S. Park, J. Phys. Chem. B 105, 5677 (2001). http://dx.doi.org/10.1021/jp0102365
J. Bae, Y. Yoon, S. Lee and H. Baik, Physica B 323, 169 (2002). http://dx.doi.org/10.1016/S0921-4526(02)00890-6
D. Kurnosov, A. S. Bugaev, K. N. Nikolski, R. Tchesov and E. Sheshin, Appl. Surf. Sci. 215, 232 (2003). http://dx.doi.org/10.1016/S0169-4332(03)00307-6
H. Ma, L. Zhang, J. Zhang, L. Zhang, N. Yao and B. Zang, Appl. Surf. Sci. 251, 258 (2005). http://dx.doi.org/10.1016/j.apsusc.2005.03.100