Injector Quantum Dot Molecule Infrared Photodetector: A Concept for Efficient Carrier Injection
Corresponding Author: Thomas Gebhard
Nano-Micro Letters,
Vol. 3 No. 2 (2011), Article Number: 121-128
Abstract
Quantum dot infrared photodetectors are expected to be a competitive technology at high operation temperatures in the long and very long wavelength infrared spectral range. Despite the fact that they already achieved notable success, the performance suffers from the thermionic emission of electrons from the quantum dots at elevated temperatures resulting in a decreasing responsivity. In order to provide an efficient carrier injection at high temperatures, quantum dot infrared photodetectors can be separated into two parts: an injection part and a detection part, so that each part can be separately optimized. In order to integrate such functionality into a device, a new class of quantum dot infrared photodetectors using quantum dot molecules will be introduced. In addition to a general discussion simulation results suggest a possibility to realize such adevice.
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- A. Rogalski, Opto-Electron. Rev. 14, 84 (2006). http://dx.doi.org/10.2478/s11772-006-0012-2
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- Homepage Walter Schottky Institute, Munich.
- G. Jolley, L. Fu, H. H. Tan and C. Jagadish, Nanoscale 2, 1128 (2010). http://dx.doi.org/10.1039/c0nr00128g
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- Q. Xie, A. Madhukar, P. Chen and N. P. Kobayashi, Phys Rev. Lett. 75, 2542 (1995). http://dx.doi.org/10.1103/PhysRevLett.75.2542
- B. Kochman, A. D. Stiff-Roberts, S. Chakrabarti, J. D. Phillips, S. Krishna, J. Singh and P. Bhattacharya, IEEE J. Quantum Elect. 39, 459 (2003). http://dx.doi.org/10.1109/JQE.2002.808169
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References
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M. Z. Tidrow, W. A. Beck, W. W. Clark III, H. K. Pollehn, J. W. Little, J. K. Dhar, R. P. Leavitt, S. W. Kennerly, D. W. Beekman, A. C. Goldberg and W. R. Dyer, Opto-Electron. Rev. 7, 283 (1999). http://dx.doi.org/10.1063/1.2968128
P. Martyniuk, S. Krishna and A. Rogalski, J. Appl. Phys. 104, 034314 (2008). http://dx.doi.org/10.1063/1.2968128
D. Pan, Y. P. Zeng, M. Y. Kong, J. Wu, Y. Q. Zhu, C. H. Zhang, J. M. Li and C. Y. Wang, Electron. Lett. 32, 1726 (1996). http://dx.doi.org/10.1063/1.363742
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H. Lim, S. Tsao, W. Zhang and M. Razeghi, Appl. Phys. Lett. 90, 131112 (2007). http://dx.doi.org/10.1063/1.2719160
X. Lu, J. Vaillancourt and M. J. Meisner, Appl. Phys. Lett. 91, 051115 (2007). http://dx.doi.org/10.1063/1.2766655
E. T. Kim, A. Madhukar, Z. Ye and J. C. Campbell, Appl. Phys. Lett. 84, 3277 (2004). http://dx.doi.org/10.1063/1.1719259
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J. Shao, T. E. Vandervelde, A. Barve, W. Y. Jang, A. Stintz and S. Krishna, J. Vac. Sci. Technol. B 29, 03C123 (2011).
V. Ryzhii, I. Khmyrova, V. Pipa, V. Mitin and M. Willander, Semicond. Sci. Technol. 16 331 (2001). http://dx.doi.org/10.1116/1.3562186
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S. Krishna, J. Phys. D: Appl. Phys. 38, 2142 (2005). http://dx.doi.org/10.1088/0022-3727/38/13/010
A. V. Barve, T. Rotter, Y. Sharma, S. J. Lee, S. K. Noh and S. Krishna, Appl. Phys. Lett. 97, 061105 (2010). http://dx.doi.org/10.1063/1.3475022
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A. Persano, A. Cola, A. Taurino, M. Catalano, M. Lomascolo, A. Convertino, G. Leo, L. Cerri, A. Vasanelli and L. Vasanelli, J. Appl. Phys. 102, 094314 (2007). http://dx.doi.org/10.1063/1.2812427
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S. Y. Wang, S. D. Lin, H. W. Wu and C. P. Lee, Appl. Phy. Lett. 78 1023 (2001). http://dx.doi.org/10.1063/1.1347006
X. H. Su, J. Yang, P. Bhattacharya, G. Ariyawansa and A. G. U. Perera, Appl. Phy. Lett. 89, 031117 (2006). http://dx.doi.org/10.1063/1.2233808
H. S. Ling, S. Y. Wang, C. P. Lee and M. C. Lo, Infrared Phys. Techn. 52, 281 (2009). http://dx.doi.org/10.1016/j.infrared.2009.05.026
Homepage Walter Schottky Institute, Munich.
G. Jolley, L. Fu, H. H. Tan and C. Jagadish, Nanoscale 2, 1128 (2010). http://dx.doi.org/10.1039/c0nr00128g
M. De Giorgi, C. Lingk, G. von Plessen, J. Feldmann, S. De Rinaldis, A. Passaseo, M. De Vittorio and R. Cingolani, Appl. Phy. Lett. 79, 3968 (2001). http://dx.doi.org/10.1063/1.1421235
T. Mueller, F. F. Schrey, G. Strasser and K. Unterrainer, Appl. Phy. Lett. 83, 3572 (2003).http://dx.doi.org/10.1063/1.1622432
A. R. Kovsh, A. E. Zhukova, A. Yu. Egorova, V. M. Ustinova, Yu. M. Shernyakova, M. V. Maximova, V. V. Volovika, A. F. Tsatsul’nikova, Yu. V. Musikhina, N. N. Ledentsova, P. S. Kop’eva, D. Bimberg and Z. I. Alferov, J. Cryst. Growth 201, 1117 (1999). http://dx.doi.org/10.1016/S0022-0248(98)01538-3
K. Gawarecki, M. Pochwała, Anna Grodecka-Grad and P. Machnikowski, Phys. Rev. B 81, 245312 (2010). http://dx.doi.org/10.1103/PhysRevB.81.245312
A. S. Bracker, M. Scheibner, M. F. Doty, E. A. Stinaff, I. V. Ponomarev, J. C. Kim, L. J. Whitman, T. L. Reinecke and D. Gammon, Appl. Phy. Lett. 89, 233110 (2006). http://dx.doi.org/10.1063/1.2400397
Z. R. Wasilewski, S. Fafard, J. P. McCaffrey, J. Cryst. Growth 201, 1131 (1999). http://dx.doi.org/10.1016/S0022-0248(98)01539-5
Q. Xie, A. Madhukar, P. Chen and N. P. Kobayashi, Phys Rev. Lett. 75, 2542 (1995). http://dx.doi.org/10.1103/PhysRevLett.75.2542
B. Kochman, A. D. Stiff-Roberts, S. Chakrabarti, J. D. Phillips, S. Krishna, J. Singh and P. Bhattacharya, IEEE J. Quantum Elect. 39, 459 (2003). http://dx.doi.org/10.1109/JQE.2002.808169
L. Höglund, P. O. Holtz, H. Pettersson, C. Asplund, Q. Wang, S. Almqvist, S. Smuk, E. Petrini and J. Y. Andersson, Appl. Phy. Lett. 93, 103501 (2008). http://dx.doi.org/10.1063/1.2977757
P. Bhattacharya, J. Singh, H. Yoon, X. Zhang, A. Gutierrez-Aiken and Y. Lam, IEEE J. Quantum Elect. 32, 1620 (1996). http://dx.doi.org/10.1109/3.535367
P. Aivaliotis, E. A. Zibik, L. R. Wilson, J. W. Cockburn, M. Hopkinson and N. Q. Vinh, Appl. Phys. Lett. 92, 023501 (2008). http://dx.doi.org/10.1063/1.2833691