4-Aminothiophenol Strong SERS Signal Enhancement at Electrodeposited Silver Surface
Corresponding Author: Lenka Škantárová
Nano-Micro Letters,
Vol. 4 No. 3 (2012), Article Number: 184-188
Abstract
Strong surface enhancement Raman spectroscopy signal of 4-aminothiophenol on silver substrate prepared by controlled electrodeposition is documented in this article. Enhancement factor was found to be affected not only by nanoparticle size, shape, orientation and spatial distribution, but also by interaction of Ag nanoparticles with thiol group of testing analyte. Self-assembled monolayers formation was contributed to this unique signal enhancement. The enhancement factor was established of 1.81×1014.
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References
B. Reents, G. Lacconi and W. Plieth, J. Electroanal. Chem. 376, 185 (1994). http://dx.doi.org/10.1016/0022-0728(94)03615-2
F. Fathi, F. Lagugn, Labarthet, D. B. Pedersen and H. B. Kraatz, Analyst 137, 4448 (2012). http://dx.doi.org/10.1039/c2an35641d
M. Potara, M. Baia, C. Farcau and S. Astilean, Nanotechnology 23, 055501 (2012). http://dx.doi.org/10.1088/0957-4484/23/5/055501
M. Moskovits, Rev. Mod. Phys. 57, 783 (1985). http://dx.doi.org/10.1103/RevModPhys.57.783
A. Otto, J. Raman Spectrosc. 22, 743 (1991). http://dx.doi.org/10.1002/jrs.1250221204
U. Kreibig and M. Vollmer, Properties of Metal Clusters, Springer Series in Metal Science, 25, 1995.
M. J. Mulvihill, X. Y. Ling, J. Henzie and P. Yang, J. Am. Chem. Soc. 132, 268 (2010). http://dx.doi.org/10.1021/ja906954f
P. M. Shirage, D. D. Shivagan, L. A. Ekal, N. V. Desai, S. B. Mane and S. H. Pawar, Appl. Surf. Sci. 182, 403 (2001). http://dx.doi.org/10.1016/S0169-4332(01)00459-7
R. K. Chang and T. E. Furtak (Eds.) Surface Enhanced Raman Scattering, Plenum, New York, 1982.
W. Plieth, H. Dietz, A. Anders, G. Sandmann, A. Meixner, M. Weber and H. Kneppe, Surf. Sci. 597, 119 (2005). http://dx.doi.org/10.1016/j.susc.2004.02.042
R. Kodiyath, J. Wang, Z. A. Combs, S. Chang, M. K. Gupta, K. D. Anderson, R. J. C. Brown and V. V. Tsukruk, Small 7, 3452 (2011). http://dx.doi.org/10.1002/smll.201101936
E. S. Papazoglou, S. Babu, S. Mohapatra, D. R. Hansberry and C. Patel, Nano-Micro Lett. 2, 74 (2010). http://dx.doi.org/10.5101/nml.v2i2.p74-82
K. G. Stamplecoskie, J. C. Scaiano, V. S. Tiwari and H. Anis, J. Phys. Chem. C 115, 1403 (2011). http://dx.doi.org/10.1021/jp106666t
X. Li, J. Zhang, W. Xu, H. Jia, X. Wang, B. Yang, B. Zhao, B. Li and Y. Ozaki, Langmuir 19, 4285 (2003). http://dx.doi.org/10.1021/la0341815
J. Deng, J. Du, Y. Wang, Y. Tu and J. Di, Electrochem. Commun. 13, 1517 (2011). http://dx.doi.org/10.1016/j.elecom.2011.10.010
L. J. Sherry, R. Jin, Ch. A. Mirkin, G. C. Schatz and R. P. Van Duyne, Nano Lett. 6, 2060 (2006). http://dx.doi.org/10.1021/nl061286u
C. S. Levin, B. G. Janesko, R. Bardhan, G. E. Scuseria, J. D. Hartgerink and N. J. Halas, Nano Lett. 6, 2617 (2006). http://dx.doi.org/10.1021/nl062283k
M. A. Bryant and J. E. Pemberton, J. Am. Chem. Soc. 113, 8284 (1991). http://dx.doi.org/10.1021/ja00022a014
Ch. K. Klutse, A. Mayer, J. Wittkamper and B. M. Cullum, J. Nanotechnol. Article ID 319038 (2012). http://dx.doi.org/10.2116/analsci.26.957
Y. Yhou, J. Yhi, J. Yhao and M. Xu, Anal. Sci. 26, 957 (2010). http://dx.doi.org/10.2116/analsci.26.957
Q. Zhou, X. X. Zhang, F. Z. Pang, X. W. Li, J. W. Zheng and T. H. Lu, Acta Chim. Sinica 63, 1561 (2005).