Issue

Vol. 16 (2024)

Recent Advances in Patterning Strategies for Full-Color Perovskite Light-Emitting Diodes

https://doi.org/10.1007/s40820-023-01254-8
Gwang Heon Lee
Graduate School of Semiconductor Materials and Devices Engineering, Center for Future Semiconductor Technology (FUST), Ulsan National Institute of Science and Technology (UNIST), Ulsan 44919, Republic of Korea
Kiwook Kim
Department of Energy Science and Engineering, Daegu Gyeongbuk Institute of Science and Technology (DGIST), Daegu 42988, Republic of Korea
Yunho Kim
Graduate School of Semiconductor Materials and Devices Engineering, Center for Future Semiconductor Technology (FUST), Ulsan National Institute of Science and Technology (UNIST), Ulsan 44919, Republic of Korea
Jiwoong Yang
Department of Energy Science and Engineering, Daegu Gyeongbuk Institute of Science and Technology (DGIST), Daegu 42988, Republic of Korea
Moon Kee Choi
Graduate School of Semiconductor Materials and Devices Engineering, Center for Future Semiconductor Technology (FUST), Ulsan National Institute of Science and Technology (UNIST), Ulsan 44919, Republic of Korea

Corresponding Author: Moon Kee Choi

mkchoi@unist.ac.kr

Nano-Micro Letters, Vol. 16 (2024), Article Number: 45

Abstract

Metal halide perovskites have emerged as promising light-emitting materials for next-generation displays owing to their remarkable material characteristics including broad color tunability, pure color emission with remarkably narrow bandwidths, high quantum yield, and solution processability. Despite recent advances have pushed the luminance efficiency of monochromic perovskite light-emitting diodes (PeLEDs) to their theoretical limits, their current fabrication using the spin-coating process poses limitations for fabrication of full-color displays. To integrate PeLEDs into full-color display panels, it is crucial to pattern red–green–blue (RGB) perovskite pixels, while mitigating issues such as cross-contamination and reductions in luminous efficiency. Herein, we present state-of-the-art patterning technologies for the development of full-color PeLEDs. First, we highlight recent advances in the development of efficient PeLEDs. Second, we discuss various patterning techniques of MPHs (i.e., photolithography, inkjet printing, electron beam lithography and laser-assisted lithography, electrohydrodynamic jet printing, thermal evaporation, and transfer printing) for fabrication of RGB pixelated displays. These patterning techniques can be classified into two distinct approaches: in situ crystallization patterning using perovskite precursors and patterning of colloidal perovskite nanocrystals. This review highlights advancements and limitations in patterning techniques for PeLEDs, paving the way for integrating PeLEDs into full-color panels.


Highlights:
1 This article reviews the recent progress in the patterning techniques of metal halide perovskites for full-color displays.
2 Patterning techniques of perovskites are subdivided into in situ crystallization and patterning of colloidal perovskite nanocrystals, including photolithography, inkjet printing, thermal evaporation, laser ablation, transfer printing, and so on.
3 The strength and weakness of each patterning methods are discussed in detail from the viewpoint of their applications in full-color displays.

Keywords

Perovskite Light-emitting diode Full-color display High-resolution patterning Electroluminescence
Lee, Gwang Heon, Kiwook Kim, Yunho Kim, Jiwoong Yang, and Moon Kee Choi. 2023. “Recent Advances in Patterning Strategies for Full-Color Perovskite Light-Emitting Diodes”. Nano-Micro Letters 16 (December):45. https://doi.org/10.1007/s40820-023-01254-8.
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