Li, J., Guo, Y., Wang, K., Huang, W., Su, H., Li, W., Zhou, X., Zhang, Y., Guo, T. and Wu, C. 2025. Shadow-Assisted Sidewall Emission for Achieving Submicron Linewidth Light Source by Using Normal UV Photolithography. Nano-Micro Letters. 17, (Apr. 2025), 228. DOI:https://doi.org/10.1007/s40820-025-01737-w.